Properties of Tantalum Coating Prepared via Double Glow Plasma Surface Metallurgy Technique on Thick Diamond Film Surface
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摘要: 采用双辉等离子表面冶金技术在机械抛光后的金刚石厚膜表面制备钽涂层，研究了涂层的表面及截面形貌、微区成分、物相组成及结合性能。结果表明：制备得到的钽涂层连续、均匀，由钽金属层与界面处的化合物层组成，厚度约1.7 μm，组织为柱状晶；金刚石厚膜与钽涂层的界面处存在厚度约为1.1 μm的钽与碳元素呈梯度分布的扩散区，且生成了TaC和Ta2C两种化合物；钽原子填充了金刚石厚膜抛光产生的磨痕，其表面粗糙度由128 nm降低为57 nm；钽涂层的塑性以及与金刚石厚膜的结合性能良好。Abstract: Tantalum coating was prepared on mechanically polished thick diamond film via double glow plasma surface metallurgy technique. The surface and section morphology, micro-area composition, phase composition and bonding property of the coating were studied. The results show that the tantalum coating was continuous and uniform, consisting of tantalum metallic layer and compound layer at the interface. The coating thickness was about 1.7 μm, and the coating structure was composed of columnar crystal. A 1.1 μm thick diffusion zone with tantalum and carbon distributed in gradient was formed at the interface of the tantalum coating and the thick diamond film, and two compounds of TaC and Ta2C were formed here. The polishing scratches on the thick diamond film were filled up by tantalum atoms, and therefore reduced the surface roughness from 128 nm to 57 nm. The obtained tantalum coating had good plasticity and good bonding performance with the thick diamond film.
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