Abstract: Three films of TiN, Ti-Al-N and Ti-Si-N were prepared by physical vapor deposition (PVD). The influence of aluminum and silicon addition on microstructure and properties of films was studied. The results show that the Ti₃AlN phase existed preferred orientatian in microstructure of Ti-Al-N film, and a coarse columnar crystal microstructure formed. The Si₃N₄ phase formed in Ti-Si-N film, and the microstructure of Ti-Si-N film was more fine. The film base bonding force was the smallest of Ti-Al-N film and was the largest of Ti-Si-N film. The Ti-Al-N film had the smallest surface roughness and the largest hardness and elastic modulus.The friction factor of Ti-Si-N film was slightly higher than that of Ti-Al-N film, but the difference between them was small, which should be related to the fact that the microstructure of Ti-Si-N film was fine, and Si₃N₄ phase formed by Ti-Si-N film had a certain self-lubricating property.