Abstract: CrAlN nano-multilayer films were prepared by magnetron sputtering technique under different bias voltages (-60,-70,-80,-90 V) of the substrate, and the effect of bias voltage of the substrate on the microstructure and mechanical properties of the film was studied. The results show that with increasing absolute value of the substrate bias voltage, the nitrogen content in the CrAlN nano-multilayer film increased, the phase composition unchanged, the preferred orientation changed from the CrN (111) crystal plane to the CrN (200) crystal plane, the pores on the film surface decreased, and the densification of microstructure was improved. When the bias voltage of the substrate was between -60 and -80 V, the bias voltage had little effect on the film deposition rate. When absolute value of the bias voltage was higher than 80 V, the deposition rate decreased significantly. With increasing absolute value of bias voltage of the substrate, the hardness and elastic modulus of the film increased, and the film base bonding force increased and then decreased, reaching the maximum at -80 V of bias voltage.