Abstract: Sputtering targets are the key raw materials for the preparation of thin films by magnetron sputtering, and their quality determines the performance of the sputtered thin films. Precious metal sputtering targets are widely used in the preparation of high-performance thin films because of their excellent physical and chemical properties. The research progress on the preparation methods, technical requirements and application of precious metal sputtering targets is reviewed. The development direction of high purity, large size, high utilization rate, and integrated development of target production and sputtering film is put forward.