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    王法栋, 赵洪峰, 谢清云. In2O3掺杂量对锑基SnO2压敏电阻电气性能的影响[J]. 机械工程材料, 2023, 47(6): 25-29,66. DOI: 10.11973/jxgccl202306005
    引用本文: 王法栋, 赵洪峰, 谢清云. In2O3掺杂量对锑基SnO2压敏电阻电气性能的影响[J]. 机械工程材料, 2023, 47(6): 25-29,66. DOI: 10.11973/jxgccl202306005
    WANG Fadong, ZHAO Hongfeng, XIE Qingyun. Influence of In2O3 Doping Amount on Electrical Properties of Sb-based SnO2 Varistors[J]. Materials and Mechanical Engineering, 2023, 47(6): 25-29,66. DOI: 10.11973/jxgccl202306005
    Citation: WANG Fadong, ZHAO Hongfeng, XIE Qingyun. Influence of In2O3 Doping Amount on Electrical Properties of Sb-based SnO2 Varistors[J]. Materials and Mechanical Engineering, 2023, 47(6): 25-29,66. DOI: 10.11973/jxgccl202306005

    In2O3掺杂量对锑基SnO2压敏电阻电气性能的影响

    Influence of In2O3 Doping Amount on Electrical Properties of Sb-based SnO2 Varistors

    • 摘要: 以SnO2粉、CoO粉、Cr2O3粉、Sb2O5粉、In2O3粉为原料,在100 MPa压力和1 300 ℃温度下烧结制备(98.85-x)SnO2-1CoO-0.05Cr2O3-0.1Sb2O5-xIn2O3(x=0,0.05,0.10,0.15,物质的量分数/%)锑基SnO2压敏电阻,研究了In2O3掺杂量对压敏电阻微观结构和电气性能的影响。结果表明:随着In2O3掺杂量的增加,锑基SnO2压敏电阻的平均晶粒尺寸减小,密度先增大后减小,非线性系数、施主密度、界面态密度和势垒高度均先增大后减小,泄漏电流密度先减小后增大,电压梯度增大。当掺杂In2O3物质的量分数为0.10%时,压敏电阻的密度达到最大,为6.82 g·cm-3,综合电气性能优良,其电压梯度、非线性系数、泄漏电流密度、施主密度、界面态密度和势垒高度分别为851 V·mm-1,32.36,1.19 μA·cm-2,4.4×1023 m-3,3.2×1016 m-2和1.44 eV。

       

      Abstract: (98.85-x)SnO2-1CoO-0.05Cr2O3-0.1Sb2O5-xIn2O3 (x=0, 0.05, 0.10, 0.15, mole fraction/%) Sb-based SnO2 varistors were prepared by sintering SnO2 powder, CoO powder, Cr2O3 powder, Sb2O5 powder and In2O3 powder at a pressure of 100 MPa and a temperature of 1 300 ℃. The effect of In2O3 doping amount on the microstructure and electrical properties of varistors was studied. The results show that with increasing In2O3 doping amount, the average grain size of Sb-based SnO2 varistors decreased, the density increased first and then decreased, the nonlinear coefficient, applied density, interfacial state density and barrier height all increased first and then decreased, the leakage current density decreased first and then increased, and the voltage gradient increased. When the mole fraction of doped In2O3 was 0.10%, the varistor had the largest density of 6.82 g·cm-3 and the excellent electrical properties with voltage gradient, nonlinear coefficient, leakage current density, applied density, interfacial state density and barrier height of 851 V·mm-1,32.36,1.19 μA·cm-2,4.4×1023 m-3,3.2×1016 m-2 and 1.44 eV, respectively.

       

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