Abstract: The current situation of antimony-doped tin oxide (ATO) thin film preparation techniques is outlined, including sol-gel method, radio-frequency magnetron sputtering, spray pyrolysis, chemical vapor deposition and so on. Comparison of advantages and disadvantages of various preparation methods as well as the performance of the films prepared by those methods are analyzed. The influences of process parameters such as the film thickness, doping concentration of Sb and annealing process parameters on the optical properties of film are summarized. Problems to be solved in the development of ATO films with excellent optical properties are elicited. Finally the development of ATO thin film is forecasted.