Abstract: By DC reactive magnetron sputtering method,Ti/TiN multilayer films were prepared on the Si (111) substrate at different temperatures.The phase and surface morphology of the films were studied by mean of X-ray diffraction and atomic force microscopy,respectively.The effect of the deposition temperature on the structure,optical and electrical properties of the thin-film was investigated.The results show that Ti/TiN multilayer films prepared at different temperatures were all composed of Ti and TiN.With the increase of the deposition temperature the surface roughness of the Ti/TiN multilayer film and TiN single film decreased,and the resistivity reduced significantly.The surface morphology of the multilayer film was more dense and homogenous.The multilayer film infrared reflectance was related to the resistivity.The smaller the resistivity,the larger the infrared reflectance.