磁控溅射MoS2/Ni复合膜的制备及其摩擦性能
Preparation and Tribology Performance of Magnetron Sputtering MoS2/Ni Composite Films
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摘要: 采用磁控溅射法制备了MoS2/Ni复合膜,同时对影响膜层性能的工艺参数进行了初步探讨,并对复合膜进行了成分与结构分析以及摩擦试验.结果表明:在本试验工艺参数(本底真空度为7.0×10-4 Pa,沉积气压为0.5 Pa,溅射功率为160 W,溅射氩气流量为80 cm3/s,靶基距为60 mm,基片温度为70 ℃)下制备的MoS2/Ni复合膜能够大大降低不锈钢等基底表面的摩擦因数,并且在高速重载的条件下具有更低的摩擦因数和更小的摩擦因数波动值.Abstract: The depositon technology of magnetron sputtering MoS2/Ni composite films was introduced.Several factors that affected the properties of films were studied initially.Composite films were analyzed by means of EDS and XRD,and friction properties were tested,too.The deposition parameters of MoS2/Ni film were gained as follows:background vacuum 7.0×10-4 Pa,deposition air pressure 0.5 Pa,sputtering power 160 W,Ar sputtering flux 80 cm3/s,target cardinal distance 60 mm and substrate temperature 60 ℃.The friction coefficient and its fluctuation of the films were very low.The friction and wear properties of the films were improved under the conditions of heavy load and high speed.
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