Abstract:
SiO2 functional coatings with TEOS as substrate and air as carrier gas were prepared on steel HP40 (25Cr35Ni) by means of atmospheric pressure chemical vapor deposition (APCVD).The effects of disposition temperature,substrate temperature and carrier gas flow on the deposition rate of SiO2 functional coatings were investigated,and SiO2 functional coatings were studied by means of XRD and SEM.The results show that 60 ℃ substrate temperature,800 ℃ deposition temperature and 3.33 L·min-1 gas rate are the appropriate processing parameters to deposit the best coatings with uniform,compact surface and certain bond strength.