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    谭文昌, 郑军君, 罗汇果, 胡昌旭, 倪东惠. 放电等离子烧结钼和钨基体上(l—x)Ti3SiC2+xSiC层状复合材料的显微组织[J]. 机械工程材料, 2011, 35(8): 48-50.
    引用本文: 谭文昌, 郑军君, 罗汇果, 胡昌旭, 倪东惠. 放电等离子烧结钼和钨基体上(l—x)Ti3SiC2+xSiC层状复合材料的显微组织[J]. 机械工程材料, 2011, 35(8): 48-50.
    TAN Wen-chang, ZHENG Jun-jun, LUO Hui-guo, HU Chang-xu, NI Dong-hui. Microstructure of Molybdenum and Tungsten Matrix (l—x)Ti3SiC2+xSiC Layered Composites Prepared by Spark Plasma Sintering[J]. Materials and Mechanical Engineering, 2011, 35(8): 48-50.
    Citation: TAN Wen-chang, ZHENG Jun-jun, LUO Hui-guo, HU Chang-xu, NI Dong-hui. Microstructure of Molybdenum and Tungsten Matrix (l—x)Ti3SiC2+xSiC Layered Composites Prepared by Spark Plasma Sintering[J]. Materials and Mechanical Engineering, 2011, 35(8): 48-50.

    放电等离子烧结钼和钨基体上(l—x)Ti3SiC2+xSiC层状复合材料的显微组织

    Microstructure of Molybdenum and Tungsten Matrix (l—x)Ti3SiC2+xSiC Layered Composites Prepared by Spark Plasma Sintering

    • 摘要: 以元素粉体为原料, 采用分层布粉和放电等离子烧结技术制备了钼基体和钨基体上的(1-x)Ti3SiC2+xSiC(x=0, 0.1, 0.2)层状复合材料, 并对其各层及界面显微组织进行分析。结果表明:经1300℃烧结后, 层状复合材料中钼层与Ti3SiC2 层以及钨层与Ti3SiC2 层都有明显的过渡层生成, 而且过渡层界面都较平直和清晰, 界面处没有明显的缺陷, 界面结合紧密, 钼层和Ti3SiC2 层的过渡层约有80μm 厚, 钨层和Ti3SiC2 层的过渡层则达到50μm;烧结后得到致密的钼层, 而钨层则孔洞较多。

       

      Abstract: The molybd enum and tungsten matrix layered composites were prepared by stepwise laying of elemental powders and spark plasma sintering technology, and the microstructure of their interface was analyzed. The results show that the obvious transition layers were built in the interfaces between molybdenum layer and Ti3SiC2 layer, tungsten layer and Ti3SiC2 layer in layered composite after sintering at 1300 ℃, and the interface of the transition layer was straight, clear and tight, and obvious defection had not observed. The thickness of the transiti onlayer between molybdenum layer and Ti3SiC2 layer, tungsten layer and Ti3SiC2 layer were about 80, 50 μm respectively. After sintering at 1300 ℃, compact molybdenum layer was obtained and tungsten layer contained more pores.

       

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