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    王翠凤, 邱锡荣, 康爱军, 梁家豪, 黄文荣. S136不锈钢基体溅射氮化铬薄膜的硬度和接触角[J]. 机械工程材料, 2013, 37(12): 21-26.
    引用本文: 王翠凤, 邱锡荣, 康爱军, 梁家豪, 黄文荣. S136不锈钢基体溅射氮化铬薄膜的硬度和接触角[J]. 机械工程材料, 2013, 37(12): 21-26.
    WANG Cui-feng, QIU Xi-rong, KANG Ai-jun, LIANG Jia-hao, HUANG Wen-rong. Hardness and Contact Angle of CrN Coating Sputtered on Matrix of S136 Stainless Steels[J]. Materials and Mechanical Engineering, 2013, 37(12): 21-26.
    Citation: WANG Cui-feng, QIU Xi-rong, KANG Ai-jun, LIANG Jia-hao, HUANG Wen-rong. Hardness and Contact Angle of CrN Coating Sputtered on Matrix of S136 Stainless Steels[J]. Materials and Mechanical Engineering, 2013, 37(12): 21-26.

    S136不锈钢基体溅射氮化铬薄膜的硬度和接触角

    Hardness and Contact Angle of CrN Coating Sputtered on Matrix of S136 Stainless Steels

    • 摘要: 在不同的S136不锈钢基体上溅射制备了氮化铬(CrN)薄膜, 通过接触角的测量、硬度测试、扫描电子显微镜观察及X射线衍射分析等方法研究了基材的组织、方向性、表面粗糙度、表面机械加工方法及溅射偏压对CrN薄膜接触角和硬度的影响。结果表明: 在溅射功率300 W、施加-120 V偏压、氩气和氮气流量比9∶1溅射条件下, 可得到Cr2N单相薄膜, 呈现(111)面择优取向; 溅射CrN薄膜显著提高S136不锈钢表面硬度和接触角; 溅射时施加负偏压的CrN薄膜接触角明显大于未施加的; 基材杂质少、碳化物细小、研磨后抛光、施加负偏压的纵向试样溅射CrN薄膜后硬度较高(1 177 HV)、接触角较大(98.77°)。

       

      Abstract: CrN coating was prepared on the surface of different S136 stainless steels by sputtering. By means of contact angle measurement, hardness testing, scanning electron microscopy (SEM) and X-ray diffraction (XRD), effects of parameters such as microstructure, orientation, surface roughness, machining process and sputtering bias on the contact angle and hardness of CrN coating were studied. The experimental results indicate that single phase Cr2N coating with the preferred orientation of (111) plane was obtained by sputtering under conditions of 300 W, -120 V bias when the flow ratio of argon to nitrogen was 9∶1. The surface hardness and contact angle of S136 stainless steels were significantly improved after CrN sputtering. The contact angle of CrN coating sputtered with bias voltage was obviously larger than that without bias voltage. The longitudinal direction samples with less impurities and fine carbides, polished after grinded and sputtered with bias voltage, had higher hardness (1 177 HV) and larger contact angle (98.77°) after CrN sputtering.

       

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