高级检索
    李英伟, 林春芳, 周晓, 朱兴文. Na+掺杂ZnO薄膜的结构和电学性能[J]. 机械工程材料, 2007, 31(8): 15-18.
    引用本文: 李英伟, 林春芳, 周晓, 朱兴文. Na+掺杂ZnO薄膜的结构和电学性能[J]. 机械工程材料, 2007, 31(8): 15-18.
    LI Ying-wei, LIN Chun-fang, ZHOU Xiao, ZHU Xing-wen. Structural and Electrical Properties of Na+-doped ZnO Thin Films[J]. Materials and Mechanical Engineering, 2007, 31(8): 15-18.
    Citation: LI Ying-wei, LIN Chun-fang, ZHOU Xiao, ZHU Xing-wen. Structural and Electrical Properties of Na+-doped ZnO Thin Films[J]. Materials and Mechanical Engineering, 2007, 31(8): 15-18.

    Na+掺杂ZnO薄膜的结构和电学性能

    Structural and Electrical Properties of Na+-doped ZnO Thin Films

    • 摘要: 以醋酸锌为溶质、碳酸钠为钠源,采用溶胶-凝胶法在Si〈100〉衬底上制备了钠掺杂ZnO薄膜,掺杂浓度分别为0,0.018,0.036,0.045,0.063和0.09 mol/L.研究了钠掺杂后ZnO晶胞尺寸和表面形貌的变化规律,用霍尔效应仪测试了试样的载流子浓度及导电类型,分析了材料的拉曼光谱与试样内部缺陷浓度的关系.结果表明:Na+离子可进入ZnO晶格取代Zn2+,导致晶胞变大,同时ZnO薄膜由n-型转变为p-型导电;当Na+掺杂浓度达0.045 mol/L时,其电阻率为75.7 Ω·cm,空穴浓度2.955×1017/cm3.

       

      Abstract: Na+-doped ZnO thin films were prepared on Si〈100〉 substrate by sol-gel method using zinc acetate and sodium carbonate as starting materials,the doping amount is 0,0.018,0.036,0.045,0.063 and 0.090 mol/L,respectively.The phase structural characteristics and electrical properties,including the cell size of ZnO lattice,the conducting type as well as the Raman shift,of the so-obtained films were investigated by XRD,SEM,Raman scattering analysis and four-point probe van der Pauw method.The results showed that Na+ can occupy the Zn2+ sites of ZnO lattice,leading to the enlargement of ZnO cell.After doping Na+,the conductive type of ZnO films changed to p from n-type,and the resistivity,Hall mobility,and the hole concentration of the film with 0.045 mol/L Na+ were 75.7 Ω·cm and 2.955×1017/cm3,respectively.

       

    /

    返回文章
    返回