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    李宁, 邵红红. 射频磁控溅射法制备氮化硼薄膜[J]. 机械工程材料, 2006, 30(11): 15-17.
    引用本文: 李宁, 邵红红. 射频磁控溅射法制备氮化硼薄膜[J]. 机械工程材料, 2006, 30(11): 15-17.
    LI Ning, SHAO Hong-hong. Deposition of BN Films by Radio Frequency Magnetron Sputtering[J]. Materials and Mechanical Engineering, 2006, 30(11): 15-17.
    Citation: LI Ning, SHAO Hong-hong. Deposition of BN Films by Radio Frequency Magnetron Sputtering[J]. Materials and Mechanical Engineering, 2006, 30(11): 15-17.

    射频磁控溅射法制备氮化硼薄膜

    Deposition of BN Films by Radio Frequency Magnetron Sputtering

    • 摘要: 采用射频磁控溅射方法在T10钢表面获得了氮化硼薄膜.借助光学显微镜、摩擦磨损试验仪和划痕试验仪等研究了溅射时间、溅射功率以及中间层对薄膜性能的影响.结果表明:氮化硼薄膜的摩擦因数约为钢基材料的一半,中间层镍磷合金的加入使薄膜结合力显著提高.

       

      Abstract: The film of boron nitride(BN) was deposited on the surface of T10 steel by the method of radio frequency magnetron sputtering at room-temperature.With optical microscope,friction and wear spectrometer and scratch spectrometer,the influence of the parameters of sputtering time,sputtering power and interface layer on the film was studied.The results showed that the friction factor of BN film was about half of that of the steel based materials,and the cohesion between film and substrate could obviously be increased by the Ni-P interface layer.

       

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