Abstract: The amorphous Si films were deposited on NiTi films by radio frequency magnetron sputtering,then annealed at different temperatures.The effect of annealing temperature on the crystallization characteristics and mechanical properties of the NiTi/Si films was studied by XRD,SEM and nano-hardness tester.The results indicate that the Si in the NiTi/Si fims remained amorphous after annealing at 600 ℃,and obvious crystal silicon diffraction peaks ocuured above 650 ℃.The crystallinity and grain size of Si increased,the hardness and indentation creep resistance of the films decreased with increasing annealing temperature.The maximum elastic modulus could be obtained after annealing at 650 ℃.