溅射工艺参数对TiAlN薄膜力学性能及结构成分的影响

Effect of Sputtering Deposition Parameters on Mechanical Properties,Microstructure and Composition of TiAlN Coatings

摘要: 采用反应磁控溅射法和钛-铝镶嵌靶制备TiAlN薄膜;运用纳米压入硬度测试仪、划痕仪和能谱仪、X射线衍射仪等对薄膜进行表征;研究了制备工艺参数对薄膜力学性能、薄膜成分及组织结构的影响.结果表明：随着氮气分压增大,薄膜厚度降低,薄膜(111)取向减弱,(220)和(311)取向增强,薄膜中的氮原子含量逐渐增多,而钛、铝原子含量逐渐减少;随着基体偏压增大,薄膜纳米硬度和膜/基界面临界载荷均逐渐增大,纳米硬度最高可达48.73 GPa,膜/基界面临界载荷最高可达40 N.

Abstract: TiAlN coatings were deposited with Ti-Al target by reactive magnetron sputtering.TiAlN coatings with different mechanical properties,microstructure and element composition were detected by nanoindentor,EDS,XRD,etc.The effect of parameters on nanohardness and composition of coatings were studied.With the increase of N2 partial pressure,the thickness of coatings decreased and the orientation of coatings shifted from (111) to (220) and (311).The percentage of N atoms increased and the percentage of Ti,Al atoms decreased.With the increase of bias voltage,the nanohardness and critical load of coatings increased,reaching to 48.73 GPa and 40 N.