等离子体氮化与物理气相沉积复合处理的研究进展

Recent Research Progress of Plasma Nitriding and Physical Vapor Deposition Duplex Treatment

摘要: 简要综述了等离子体氮化及物理气相沉积复合处理的新进展, 主要介绍了复合处理的工艺进展、复合处理镀层的组织结构、膜/基结合力、耐磨性和耐腐蚀性, 并对复合处理的应用前景进行了展望。

Abstract: The new progress for plasma nitriding and physical vapor deposition (PN/PVD) duplex treatment is reviewed briefly. The process development, microstructure, bonding for film and the substrate, wear resistance and corrosion resistance of the duplex treatment cladding layer are mainly introduced, and the application prospect for the duplex treatment is outlooked.