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    ZHAN Ruiqiu, WU Yiwen, WANG Hongbin, CHEN Yi, ZHOU Xiao, QIN Ziwei. Microstructure and Properties of Electroplated Chromium Layer with Different Thicknesses[J]. Materials and Mechanical Engineering, 2018, 42(3): 43-47. DOI: 10.11973/jxgccl201803008
    Citation: ZHAN Ruiqiu, WU Yiwen, WANG Hongbin, CHEN Yi, ZHOU Xiao, QIN Ziwei. Microstructure and Properties of Electroplated Chromium Layer with Different Thicknesses[J]. Materials and Mechanical Engineering, 2018, 42(3): 43-47. DOI: 10.11973/jxgccl201803008

    Microstructure and Properties of Electroplated Chromium Layer with Different Thicknesses

    • In order to improve air tightness of the electroplated thick chromium layer, chromium layers with different thicknesses were prepared on the surface of substrate by the actual electroplating process in the factory. The surface internal stress, hardness, grain size and texture of the chromium layers with different thicknesses were studied. The results show that with the increase of the thickness, the surface internal stress of the chromium layer fluctuated. The surface internal stress was tensile stress. With the increase of the thickness, the larger grains in the chromium layer increased, but the average grain size changed little and was about 8.5 μm. With the increase of the thickness, (110) crystal surface texture gradually degraded, (200) crystal surface texture was enhanced gradually. With the increase of the thickness, the hardness of the chromium layer increased slowly and then rapidly when the thickness increased from 22.51 μm to 46.02 μm, and then increased slowly.
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