Atomic Oxygen Resistant Behavior of Ag and Ag-Cu Films Deposited at Low Temperature

GAO Xiao-ming; SUN Jia-yi; HU Ming; WENG Li-jun; FU Yan-long; YANG Jun; TAN Hong-gen; ZHANG Liang-jun

Materials and Mechanical Engineering > 2013 > 37(11): 55-59.

GAO Xiao-ming, SUN Jia-yi, HU Ming, WENG Li-jun, FU Yan-long, YANG Jun, TAN Hong-gen, ZHANG Liang-jun. Atomic Oxygen Resistant Behavior of Ag and Ag-Cu Films Deposited at Low Temperature[J]. Materials and Mechanical Engineering, 2013, 37(11): 55-59.

Citation:

PDF (1871 KB)

Atomic Oxygen Resistant Behavior of Ag and Ag-Cu Films Deposited at Low Temperature

More Information

Received Date: June 26, 2013

Graphical Abstract

Abstract

Abstract

Ag and Ag-Cu films were deposited at low temperature (173 K) by arc ion plating (AIP). Atomic oxygen (AO) irradiation experiments were conducted using a ground AO simulation facility. The structure and AO resistant behavior of the films were investigated by X-ray diffraction (XRD) and atomic force microscope (AFM) and compared with Ag film deposited at room temperature. The results show that crystallite size of Ag film was reduced by low temperature deposition and alloying with Cu, and its structure became more densified. So the Ag-Cu film deposited at low temperature had a dense structure beneficial for resisting oxidation of films by oxygen, and exhibited much better AO resistant behavior than that of the Ag film deposited at room temperature or at low temperature after the AO irradiation.
- low temperature deposition,
- Ag-Cu film,
- AO resistant behavior

FullText(HTML)

References (15)

References

[1]	ROBERTS E W, TODD M J. Space and vacuum tribology[J].Wear, 1990, 136: 157-167.
[2]	徐兴红, 周灵平, 彭坤, 等.银膜厚度对低辐射玻璃光学性能的影响[J].机械工程材料, 2013, 37(3): 49-52.
[3]	ROOIJ A D. The oxidation of silver by atomic oxygen[J].ESA Journal, 1989, 13: 363-382.
[4]	MOORE W M, CODELLA P J. Oxidation of silver films by atomic oxygen[J].J Phys Chem, 1988, 92: 4421-4426.
[5]	MUSI J, VLEK J. Magnetron sputtering of hard nanocomposite coatings and their properties[J].Surface and Coatings Technology, 2001, 142/144: 557-566.
[6]	KALE A, SEAL S, SOBCZAK N, et al. Effect of deposition temperature on the morphology, structure, surface chemistry and mechanical properties of magnetron sputtered Ti70-Al30 thin films on steel substrate[J].Surf Coat Technol, 2001, 141(2/3): 252-261.
[7]	高晓明, 孙嘉奕, 胡明, 等.沉积温度及膜厚对离子镀银膜结构及摩擦学性能的影响[J].机械工程材料, 2007, 31(7): 11-14.
[8]	孙晓军, 翁立军, 孙嘉奕, 等.模拟原子氧环境的真空摩擦试验装置[J].摩擦学学报, 2002, 22(6): 462-467.
[9]	SHENG H W, WILDE G, MA E. The competing crystalline and amorphous solid solutions in the Ag–Cu system[J].Acta Materialia, 2002, 50: 475-488.
[10]	WENG L J, SUN J Y, HU M, et al. Structure and tribological properties of Ag films deposited at low temperature[J].Vacuum, 2007, 81: 997-1002.
[11]	HU M, GAO X M, SUN J Y, et al. Influence of deposition temperature and pressure on microstructure and tribological properties of arc ion plated Ag films[J].Chinese Journal of Mechanical Engineering, 2012, 25: 838-844.
[12]	LAMBREGTS M J, FRANK S. Application of Vegard’s law to mixed cation sodalites: a simple method for determining the stoichiometry[J].Talanta, 2004, 62: 627-630.
[13]	HUANG J H, CHANG K H, YU G P. Synthesis and characterization of nanocrystalline ZrNxOy thin films on Si by ion plating[J].Surface and Coatings Technology, 2007, 201: 6404-6413.
[14]	REDDY M R. Review effect of low earth orbit atomic oxygen on spacecraft materials[J].Journal of Materials Science, 1995, 30: 281-307.
[15]	吴子勤, 王兵.薄膜生长[M].北京: 科学出版社, 2001.

Cited By

Get Citation

PDF

XML

Article views (3) PDF downloads (0)

Turn off MathJax

Article Contents

Abstract

References

Atomic Oxygen Resistant Behavior of Ag and Ag-Cu Films Deposited at Low Temperature

Abstract

References

Catalog

Export File

Citation

Format

Content