Preparation and Tribology Performance of Magnetron Sputtering MoS2/Ni Composite Films

The depositon technology of magnetron sputtering MoS2/Ni composite films was introduced.Several factors that affected the properties of films were studied initially.Composite films were analyzed by means of EDS and XRD,and friction properties were tested,too.The deposition parameters of MoS2/Ni film were gained as follows:background vacuum 7.0×10-4 Pa,deposition air pressure 0.5 Pa,sputtering power 160 W,Ar sputtering flux 80 cm3/s,target cardinal distance 60 mm and substrate temperature 60 ℃.The friction coefficient and its fluctuation of the films were very low.The friction and wear properties of the films were improved under the conditions of heavy load and high speed.