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    FU Yue-ju, LIU Bao-ting, GUO Ying-nan, FU Guang-sheng. Effect of Deposition Temperatures on Microstructure and Conduction Properties of La0.5Sr0.5CoO3 Films Prepared by Magnetron Sputtering[J]. Materials and Mechanical Engineering, 2009, 33(4): 18-21.
    Citation: FU Yue-ju, LIU Bao-ting, GUO Ying-nan, FU Guang-sheng. Effect of Deposition Temperatures on Microstructure and Conduction Properties of La0.5Sr0.5CoO3 Films Prepared by Magnetron Sputtering[J]. Materials and Mechanical Engineering, 2009, 33(4): 18-21.

    Effect of Deposition Temperatures on Microstructure and Conduction Properties of La0.5Sr0.5CoO3 Films Prepared by Magnetron Sputtering

    • La0.5Sr0.5CoO3 films were deposited on (001) SrTiO3 substrates at different temperatures using radio frequency magnetron sputtering method,and the effect of deposition temperatures on microstructure and conduction properties of the films were studied. The results show that when the deposition temperature was lower than 400 ℃,the prepared La0.5Sr0.5CoO3 films existed in amorphous state and there was no epitaxial growth. However,epitaxial growth of La0.5Sr0.5CoO3 films on SrTiO3 substrates happened when the deposition temperature were 550 ℃ and 650 ℃. The surface roughness of the deposited films changed regularly with the increase of deposition temperatures. The resistivity of La0.5Sr0.5CoO3 films decreased monotonically with the increase of deposition temperature,and film deposited at 650 ℃ had the lowest resistivity of 163 μΩ·cm.
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