Preparation of Stereo Lithography Materials

Photosensitive resins were synthesized using epoxy resin E-51 and acrylic acid as basic raw material,then photosensitive resins’ mixture ratio was optimized through comparing the different photosensitive resins’ UV-curing state and microhardness;and on this condition photosensitive resins were modified using disposed silane resin acceptor SiC fiber,and then solidification’s mechanical behavior such as photosensitive resins and modified photosensitive resins’ microhardness and tensile-strength were tested and matched.The result indicates that when the mass percent of prepolymer and monomer is 2∶1,content of photo-initiator is 3.5%,the photosensitive resins’ UV-curing state is the highest,performance index of hardness is optimal;and the modified photosensitive resins’ tensile-strength has great improvement.