(Mo0.85Nb0.15)Si2 Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method

JIANG Yan; ZHU Ou; ZHANG Lan-ting; YU Jin-xing; WU Jian-sheng

Materials and Mechanical Engineering > 2010 > 34(1): 38-40.

JIANG Yan, ZHU Ou, ZHANG Lan-ting, YU Jin-xing, WU Jian-sheng. (Mo_0.85Nb_0.15)Si₂ Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method[J]. Materials and Mechanical Engineering, 2010, 34(1): 38-40.

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(Mo_0.85Nb_0.15)Si₂ Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method

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Received Date: October 11, 2009

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(Mo0.85Nb0.15)Si2 single crystals were prepared by using photothermal heating floating-zone melting method.The effects of chemical composition and growth speed on getting the C40 single crystal were studied.The results show that the crack-free (Mo0.85Nb0.15)Si2 single crystals with 8 mm in diameter and 90 mm in length were prepared using the method.The surface of crystal growth was close to the (0001) plane.The growth morphology accorded with Bravairs law,PBC theory and facet growth theory.
- floating zone melting,
- single phase,
- single crystal,
- (Mo0.85Nb0.15)Si2,
- photothermal heating

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(Mo0.85Nb0.15)Si2 Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method

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(Mo_0.85Nb_0.15)Si₂ Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method