Effect of Sputtering Deposition Parameters on Mechanical Properties,Microstructure and Composition of TiAlN Coatings

CHEN Bei-bei; CAI Xun; ZHOU Tao

Materials and Mechanical Engineering > 2007 > 31(9): 15-17.

CHEN Bei-bei, CAI Xun, ZHOU Tao. Effect of Sputtering Deposition Parameters on Mechanical Properties,Microstructure and Composition of TiAlN Coatings[J]. Materials and Mechanical Engineering, 2007, 31(9): 15-17.

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Effect of Sputtering Deposition Parameters on Mechanical Properties,Microstructure and Composition of TiAlN Coatings

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Received Date: February 09, 2007

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TiAlN coatings were deposited with Ti-Al target by reactive magnetron sputtering.TiAlN coatings with different mechanical properties,microstructure and element composition were detected by nanoindentor,EDS,XRD,etc.The effect of parameters on nanohardness and composition of coatings were studied.With the increase of N2 partial pressure,the thickness of coatings decreased and the orientation of coatings shifted from (111) to (220) and (311).The percentage of N atoms increased and the percentage of Ti,Al atoms decreased.With the increase of bias voltage,the nanohardness and critical load of coatings increased,reaching to 48.73 GPa and 40 N.
- TiAlN coating,
- magnetron sputtering,
- mechanical property,
- deposition parameter

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[1]	陈淑花,潘应君,陈大凯.TiAlN薄膜的研究进展[J].工具技术,2004,38(10):6-10.
[2]	杨礼萍.高温抗氧化硬质TiAlN镀膜工艺及其应用[J].表面工程技术,1994(4):15-16.
[3]	姚舜晖,苏演良,刘醇鸿,等.磁控溅射氮化钛氮化铝纳米多层膜的抗磨性能及其在金属加工刀具中的应用研究[J].摩擦学学报,2005,25(3):258-264.
[4]	熊仁章,夏立芳,雷廷权.工艺因素对TiAlN多元涂层成分的影响[J].兵器材料科学与工程,2000,23(5):55-58.
[5]	Lii D F,Huang J L,Shew B Y.Modeling of reactively sputtered TiAlN[J].Thin Solid Films,1998,335:122-126.
[6]	Shew B Y,Huang J L,Lii D F.Effect of r.f.bias and nitrogen flow rates on the reactive sputtering of TiAlN films[J].Thin Solid Films,1997,293:212-219.
[7]	Lewis D B,Wadsworth I,Munz W D.Structure and stress of TiAlN/CrN superlattice coatings as a function of CrN layer thickness[J].Surface and Coatings Technology,1999,116/119:284-291.
[8]	李明升.电弧离子镀TiAlN及TiAlYN涂层的沉积工艺及性能研究[D].沈阳:中国科学院金属研究所,2002.
[9]	溱睿,戎泳华.X射线衍射与电子显微分析[M].上海:上海交通大学出版社,2003.

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