Recent Research Progress of Plasma Nitriding and Physical Vapor Deposition Duplex Treatment

The new progress for plasma nitriding and physical vapor deposition (PN/PVD) duplex treatment is reviewed briefly. The process development, microstructure, bonding for film and the substrate, wear resistance and corrosion resistance of the duplex treatment cladding layer are mainly introduced, and the application prospect for the duplex treatment is outlooked.